Dependence of the gas composition in a microwave plasma-assisted diamond chemical vapor deposition reactor on the inlet carbon source: CH4 versus C2H2
- 1 May 1995
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 4 (7) , 1000-1008
- https://doi.org/10.1016/0925-9635(95)00270-7
Abstract
No abstract availableKeywords
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