Ion Beam Enhanced Grain Growth in Thin Films

This publication has 7 references indexed in Scilit:

• Dominant Influence of Beam-Induced Interface Rearrangement on Solid-Phase Epitaxial Crystallization of Amorphous Silicon
  Physical Review Letters, 1985
• A Monte Carlo computer program for the transport of energetic ions in amorphous targets
  Nuclear Instruments and Methods, 1980
• Grain Growth Mechanism of Heavily Phosphorus‐Implanted Polycrystalline Silicon
  Journal of the Electrochemical Society, 1978
• A proposed method of calculating displacement dose rates
  Nuclear Engineering and Design, 1975
• Enhanced diffusion in Si and Ge by light ion implantation
  Journal of Applied Physics, 1972
• A note on integral equations of the kinchin-pease type
  Radiation Effects, 1969
• General Treatment of the Conduction Electron Redistribution due to Point Defect Complexes and Lattice Distortion in Noble Metals
  Physical Review B, 1963