The influence of the source-to-substrate distance on oxygen sorption during aluminium film deposition in vacuum
- 1 February 1973
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 15 (2) , S15-S16
- https://doi.org/10.1016/0040-6090(73)90050-3
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- The use of a quartz crystal microbalance to study the oxidation of aluminum during vacuum depositionThin Solid Films, 1971
- Deposition of Oxide Films by Reactive EvaporationJournal of Vacuum Science and Technology, 1966
- The effect of gettering on the reflectivity of aluminium filmsBritish Journal of Applied Physics, 1958