Impurity Redistribution in SiO2 ‐ Si during Oxidation: A Numerical Solution Including Interfacial Fluxes
- 1 November 1979
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 126 (11) , 1939-1945
- https://doi.org/10.1149/1.2128830
Abstract
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