Oxygen depth profiling study of copper oxide films on silicon (100) substrates by 16O(α,α)16O resonance
Open Access
- 1 February 1990
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 46 (1-4) , 287-290
- https://doi.org/10.1016/0168-583x(90)90714-6
Abstract
No abstract availableKeywords
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- Elastic Scattering of Alpha-Particles by OxygenPhysical Review B, 1953
- LX. On the decrease of velocity of swiftly moving electrified particles in passing through matterJournal of Computers in Education, 1915