Kinetic model for long-pulse XeCl laser performance
- 1 December 1981
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Quantum Electronics
- Vol. 17 (12) , 2282-2289
- https://doi.org/10.1109/jqe.1981.1070708
Abstract
Describes a kinetics model for e-beam excited XeCl lasers using Ne/Xe/HCl gas mixtures. The model has been validated by comparison with measure transient absorption in Ne/Xe mixtures, as well as by comparison with measured laser performance under a range of conditions. A key feature of the model is the inclusion of a fast three-body charge exchange process between Ne2+ and Xe which provides an efficient channel for XeCl* formation through ion-ion recombination. Xe+2 is predicted to be the dominant absorber in Ne/Xe mixtures with with xenon fractions greater than 0.75 percent, while Cl- is predicted to be the major absorber in optimum laser mixtures.Keywords
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