In situ optical multichannel spectrometer system
- 4 November 1994
- proceedings article
- Published by SPIE-Intl Soc Optical Eng
- Vol. 2253, 423-432
- https://doi.org/10.1117/12.192115
Abstract
We have realized an in-situ multichannel spectrometer system for on line optical thin film controlling during deposition. The system is working as a thin film optical monitor as well as an universal process control system. The measurements are made on the original optics during rotation, to avoid tooling factor errors and to take advantage of error compensation of successive layers. The typical thickness accuracy is 0.25% of the design wavelength.Keywords
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