Evaluation of critical design parameters of an ion projector for 1 Gbit DRAM production

• 4 February 1995
• journal article
• Published by Elsevier in Microelectronic Engineering
• Vol. 27  (1-4) , 323-326
• https://doi.org/10.1016/0167-9317(94)00116-c

Abstract

Keywords

• ALG
• KEV
• EUROPE
• CHARGE
• LENS
• LITHOGRAPHY
• CROSSOVER
• MASKS
• PROJECTORS