Calibrated exposure and focus test patterns for characterization of optical projection printing
- 31 May 1989
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 9 (1-4) , 79-82
- https://doi.org/10.1016/0167-9317(89)90017-8
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- A general simulator for VLSI lithography and etching processes: Part I—Application to projection lithographyIEEE Transactions on Electron Devices, 1979