A saddle field ion source of spherical configuration for etching and thinning applications
- 1 October 1974
- Vol. 24 (10) , 489-491
- https://doi.org/10.1016/0042-207x(74)90015-3
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- An improved form of the oscillating electron electrostatic ion source for ion etchingVacuum, 1974
- A Charged Particle OscillatorJournal of Vacuum Science and Technology, 1972