Work function changes during low pressure oxidation of aluminum at room temperature
- 31 October 1974
- journal article
- Published by Elsevier in Surface Science
- Vol. 45 (2) , 470-482
- https://doi.org/10.1016/0039-6028(74)90183-6
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Effect of eeectrode separation in contact potential difference studies in gaseous environmentsSurface Science, 1974
- Interaction of oxygen with clean aluminum surfaces by measurement of work function changesSurface Science, 1972
- Adsorption of water on clean aluminum by measurement of work function changesSurface Science, 1972
- The initial oxidation of aluminum thin films at room temperatureSurface Science, 1972
- Monolayer adsorption of oxygen on aluminiumSurface Science, 1971
- Chemisorption of oxygen by aluminiumSurface Science, 1969
- The oxidation of aluminum films in low-pressure oxygen atmospheresSurface Science, 1968
- Surface rearrangement involving chemisorbed oxygen; the aluminium-oxygen systemSurface Science, 1967
- Preparation and properties of clean surfaces of aluminumJournal of Physics and Chemistry of Solids, 1967
- Work function changes due to the chemisorption of water and oxygen on aluminumSurface Science, 1966