Spectroscopic emission studies of O2/He and N2/He plasmas in remote plasma enhanced chemical vapor deposition
- 1 May 1988
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 6 (3) , 1849-1854
- https://doi.org/10.1116/1.575267
Abstract
We have analyzed He, O2 /He, and N2 /He plasmas of the remote plasma enhanced chemical vapor deposition of a-Si:H, silicon oxide, and nitride deposition by emission optical spectroscopy and by mass spectrometry. We have detected species such as atomic N and O as well as metastable He. These will be discussed relative to the deposition of silicon nitrides, oxides, and amorphous silicon.Keywords
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