Thermal Stability Limits of Thin TiSi2 : Effect on Submicron Line Resistance and Shallow Junction Leakage
- 1 May 1994
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 141 (5) , 1351-1356
- https://doi.org/10.1149/1.2054922
Abstract
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