Development of Techniques for Real‐Time Monitoring and Control in Plasma Etching: I . Response Surface Modeling of and Etching of Silicon and Silicon Dioxide
- 1 March 1991
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 138 (3) , 789-799
- https://doi.org/10.1149/1.2085677
Abstract
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