Measuring thin film and multilayer elastic constants by coupling in situ tensile testing with x-ray diffraction

A direct determination of the Young’s modulus and the Poisson’s ratio in a 140 nm polycrystalline tungsten thin film deposited by ion-beam sputtering on a polyimide substrate has been performed by coupling x-ray diffraction measurements with in situ tensile testing. The method described in this article to extract the Young’s modulus of thin films from the evolution of the ${\sin }^2\mathrm{ \psi }$ curves as a function of applied load only requires to know the substrate Young’s modulus. The determination of the thin film Poisson’s ratio can be realized without knowing any of the substrate elastic constants. In the case of the tungsten thin film, the obtained Young’s modulus was close to the bulk material one whereas the Poisson’s ratio was significantly larger than the bulk one.