Modeling and Optimization of Oxynitride Gate Dielectrics Formation by Remote Plasma Nitridation of Silicon Dioxide
- 1 March 1999
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 146 (3) , 1111-1116
- https://doi.org/10.1149/1.1391730
Abstract
No abstract availableThis publication has 0 references indexed in Scilit: