Bromine adsorption, reaction, and etching of Cu(100)
Open Access
- 1 January 1997
- journal article
- Published by Elsevier in Surface Science
- Vol. 370 (1) , 32-46
- https://doi.org/10.1016/s0039-6028(96)00950-8
Abstract
No abstract availableThis publication has 31 references indexed in Scilit:
- Interaction of chlorine with iron(110) in the temperature range 90-1050 KJournal of the American Chemical Society, 1992
- The interaction of chlorine with copperSurface Science, 1986
- Halide formation and etching of Cu thin films with Cl2 and Br2Journal of Vacuum Science & Technology A, 1986
- Plasma-assisted etching mechanisms: The implications of reaction probability and halogen coverageJournal of Vacuum Science & Technology B, 1985
- The etching of Cu(100) with Cl2Journal of Vacuum Science & Technology A, 1985
- Etch products from the reaction on Cl2 with Al(100) and Cu(100) and XeF2 with W(111) and NbJournal of Vacuum Science & Technology B, 1985
- The adsorption of chlorine and chloridation of Ag(111)Surface Science, 1983
- An angle resolved photoemission study of the interaction between bromine and a copper (001) surfaceSurface Science, 1981
- A structural and kinetic study of chlorine and silver chloride on Ag(100): The transition from overlayer to bulk halideSurface Science, 1980
- Kinetics of the reaction of oxygen with clean nickel single crystal surfaces: I. Ni(100) surfaceSurface Science, 1974