A miniature x-ray compatible sputtering system for studying i n s i t u high T c thin film growth
- 1 January 1991
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 9 (1) , 128-132
- https://doi.org/10.1116/1.577112
Abstract
We describe a miniature sputtering system incorporating an unconventional magnetron gun and a right angle sputtering geometry. The design essentially eliminates the negative ion resputtering effect encountered in the sputtering of high Tc oxide films. The geometry is compatible with the in‐plane and conventional θ–2θ diffraction geometries and a chamber with two appropriate sector x‐ray windows has been constructed and operated at a synchrotron. Detailed data on the performance of the sputtering gun are presented.Keywords
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