Sputter cleaning and etching of crystal surfaces (Ti, W, Si) monitored by Auger spectroscopy, ellipsometry and work function change
- 1 August 1971
- journal article
- Published by Elsevier in Surface Science
- Vol. 27 (1) , 45-59
- https://doi.org/10.1016/0039-6028(71)90160-9
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Auger Electron Spectroscopy of fcc Metal SurfacesJournal of Applied Physics, 1968
- Field-Electron-Microscopy Studies of Cesium Layers on Various Refractory Metals: Work Function ChangeThe Journal of Chemical Physics, 1968
- Spherically shaped grids for a low energy electron diffraction systemJournal of Scientific Instruments, 1965