Decomposition of fluorocarbon gaseous contaminants by surface discharge induced plasma chemical processing
- 9 December 2002
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- p. 734-739
- https://doi.org/10.1109/ias.1991.178320
Abstract
Surface discharge induced plasma chemical processing (SPCP) using a high-grade alumina-based cylindrical reactor with an embedded ground electrode and stripe-shaped surface metal electrodes was applied to decompose chlorofluorocarbon contaminants in air, nitrogen, and oxygen. A very high decomposition rate, more than 99%, was observed for 100 or 1000 p.p.m. CFC-113. Greater electric power is found to be necessary to decompose the chemically stable fluorocarbon, but a substantial further improvement of efficiency will be possible in the near future. The authors feel that this system will be effective to decompose dilute fluorocarbon in large quantities.<>Keywords
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- Control of volatile organic compounds by an AC energized ferroelectric pellet reactor and a pulsed corona reactorPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2003