Effect of RF power on optical and electrical properties of ZnO thin film by magnetron sputtering
- 1 November 2001
- journal article
- Published by Elsevier in Materials Chemistry and Physics
- Vol. 72 (2) , 269-272
- https://doi.org/10.1016/s0254-0584(01)00450-3
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Optical and electrical properties of R.F. magnetron sputtered ZnO:Al thin filmsMaterials Science and Engineering: B, 1998
- Conductivity enhancement in transparetn ZnO films via Al-dopping produced by CW-CO2 laser-induced evaporationSurface and Coatings Technology, 1997
- Preparation and electrical properties of undoped zinc oxide films by CVDJournal of Materials Science Letters, 1990
- Properties of ZnO films deposited onto InP by spray pyrolysisThin Solid Films, 1986
- Electrical and optical properties of zinc oxide thin films prepared by rf magnetron sputtering for transparent electrode applicationsJournal of Applied Physics, 1984
- Electrical and optical properties of bias sputtered ZnO thin filmsSolar Energy Materials, 1982