A formalism for determining grain boundary diffusion coefficients using surface analysis
- 1 October 1976
- journal article
- other
- Published by Elsevier in Surface Science
- Vol. 59 (2) , 624-630
- https://doi.org/10.1016/0039-6028(76)90041-8
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Diffusion mechanisms in the Pd/Au thin film system and the correlation of resistivity changes with Auger electron spectroscopy and Rutherford backscattering profilesThin Solid Films, 1976
- A formalism for extracting diffusion coefficients from concentration profilesSurface Science, 1976
- Analysis of Penetration Data from Grain Boundary Diffusion ExperimentsJournal of Applied Physics, 1969
- Self-Diffusion along Edge Dislocations in NickelPhysical Review B, 1966
- The analysis of grain boundary diffusion measurementsBritish Journal of Applied Physics, 1963