An XPS study of the Ar+-induced reduction of Ni2+ in NiO and Ni-Si oxide systems
- 1 July 1991
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 51 (1-2) , 19-26
- https://doi.org/10.1016/0169-4332(91)90058-r
Abstract
No abstract availableThis publication has 19 references indexed in Scilit:
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