Plasma deposition of hydrogenated amorphous carbon (a-C:H) under a wide bias potential range
- 31 August 1991
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 47 (1-3) , 89-97
- https://doi.org/10.1016/0257-8972(91)90271-w
Abstract
No abstract availableKeywords
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