Electron injection and interfacial reactions at valve metal oxides
- 1 May 1977
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 43 (1) , 103-129
- https://doi.org/10.1016/0040-6090(77)90382-0
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- dc electrical conduction in thin Ta2O5 films. II. Highly imperfect filmsJournal of Applied Physics, 1976
- dc electrical conduction in thin Ta2O5 films. I. Bulk-limited conductionJournal of Applied Physics, 1976
- Hot-electron concept for Poole-Frenkel conduction in amorphous dielectric solidsJournal of Applied Physics, 1972
- Electron Injection into Anodic Valve Metal OxidesJournal of the Electrochemical Society, 1972
- Poole-Frenkel conduction in amorphous solidsPhilosophical Magazine, 1971
- Electron Injection into Anodic Tantalum Oxide Assisted by Ionic Interface PolarizationJournal of the Electrochemical Society, 1970
- Transition from Electrode-Limited to Bulk-Limited Conduction Processes in Metal-Insulator-Metal SystemsPhysical Review B, 1968
- Electronic properties of amorphous dielectric filmsThin Solid Films, 1967
- The Electronic Conductivity of Defective Anodic Tantalum Oxide FilmsJournal of the Electrochemical Society, 1966
- On Pre-Breakdown Phenomena in Insulators and Electronic Semi-ConductorsPhysical Review B, 1938