Crosstie memory simplified by the use of serrated strips

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Abstract
Serrated strips of Permalloy about 350 Å thick and 10μm wide are used to position domain walls, crossties, and Bloch lines, and to simplify propagation, detection, and fabrication. The serrated strips are etched so that they align along the easy axis of the film. The sawteeth on each edge of the strip give the strip a cuneated or wedge‐shaped appearance. After a magnetic field is applied normal to the strip length, the magnetization along each edge rotates back to the nearest direction which is parallel to the edge. Two domains are thus formed with a domain wall along the center of the strip. The magnetization along the edges lies parallel to the edges to minimize stray fields. The edge effects are large compared to the induced anisotropy of the film. The wall formed at the center of the strip can be postive or negative Neel or a crosstie wall. Crossties form at the necks of the strip. Bloch lines locate themselves in potential wells between the necks. These properties simplify propagation and detection. The crosstie memory can be fabricated on silicon wafer or chips with integrated drive electronics, detector amplification, and decoding.

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