Deposition and characterization of nanocrystalline diamond films

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Abstract
Highly uniform, smooth nanocrystallinediamondfilms have been fabricated with a magnetoactivemicrowavechemical vapor deposition system. The top and bottom magnet currents were 145 and 60 A, respectively, while the microwave power and substrate temperature were controlled at 1500 W and 850 °C, respectively during deposition. The total processing pressure was regulated at 40 Pa (300 mTorr) with gas‐flow rates of 30 sccm of hydrogen, 2.4 sccm of methane, and 1 sccm of oxygen. Diamondfilms obtained under these conditions have grain sizes between 0.1 and 0.3 μm, and a mean roughness of 14.95 nm. The growth rate is 0.1 μm/h. Characterization techniques have involved x‐ray diffraction, Raman spectroscopy, scanning electron microscopy, atomic force microscopy, and transmission electron microscopy. Both x‐ray and electron diffraction patterns show no evidence of graphitic phase. Although a high density of twins and stacking faults was revealed by high‐resolution electron microscopy, compact diamond grains, and clean intergranular boundaries (no graphitic phase) were observed.

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