Crystal structure and magnetic properties of Mn-Al-Ni films prepared by sputtering
- 1 May 1990
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 67 (9) , 5655-5657
- https://doi.org/10.1063/1.346106
Abstract
Mn60−xAl40Nix ternary alloy films were prepared by dc magnetron sputtering, and their crystallographic characteristics and magnetic properties have been investigated. The τ and κ phases were synthesized at a Ni content of below 7 at. % and above 10 at. %, respectively, and the mixture of both phases were synthesized at a Ni content of about 7.9 at. %. The lattice constant a of tetragonal structure in the films increased from 3.98 to 4.12 Å, and c decreased from 3.48 to 3.21 Å with the increase of Ni content. The Ms for the τ phase increased from 120 to 240 emu/cc by a few percent Ni substitution. Mn‐Al‐Ni films with single τ phase showed anisotropic characteristics in the magnetization curve due to the preferential orientation of the c axis for tetragonal crystallite.This publication has 5 references indexed in Scilit:
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