Computer simulation study of the MOCVD growth of titanium dioxide films
- 2 January 1997
- journal article
- research article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 171 (1-2) , 154-165
- https://doi.org/10.1016/s0022-0248(96)00499-x
Abstract
No abstract availableKeywords
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