Evidence for the existence of an interface transition layer for plasma CVD grown SnO2/Fe2O3 multi-layer films
- 1 October 1991
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 52 (1-2) , 53-58
- https://doi.org/10.1016/0169-4332(91)90114-y
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- A phenomenological model for surface deposition kinetics during plasma and sputter deposition of amorphous hydrogenated siliconJournal of Applied Physics, 1987
- Thin film transducers and sensorsJournal of Vacuum Science & Technology A, 1986
- Enhancement of Gas Sensitivity by Controlling Microstructure of α–Fe2O3 CeramicsJapanese Journal of Applied Physics, 1983