Diffusion of Hydrogen and Deuterium in Stack Systems of SixNyHz/SixNyDz and Crystalline Si
- 1 January 2000
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
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- Diffusion of hydrogen in low-pressure chemical vapor deposited silicon nitride filmsApplied Physics Letters, 1990
- The hydrogen content of plasma-deposited silicon nitrideJournal of Applied Physics, 1978
- Chemically Bound Hydrogen in CVD Si3 N 4: Dependence on NH 3 / SiH4 Ratio and on AnnealingJournal of the Electrochemical Society, 1977