High resolution electron beam lithography using ZEP-520 and KRS resists at low voltage

• 1 November 1996
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
• Vol. 14  (6) , 3829-3833
• https://doi.org/10.1116/1.588676

Abstract

Keywords

• ELECTRON BEAM LITHOGRAPHY
• NANOSTRUCTURES
• LITHOGRAPHY
• SPATIAL RESOLUTION
• ELECTRON BEAM
• HIGH VOLTAGE
• HIGH ASPECT RATIO
• ETCHING
• PROXIMITY EFFECT
• SILICON
• LOW VOLTAGE
• SENSITIVITY
• HIGH RESOLUTION