Inducible Plasmid-mediated Copper Resistance in Escherichia coli

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Abstract
The Cu resistance in E. coli determined by plasmid pRJ1004 is inducible. The level of reistance is proportional to the inducing dose of Cu. The level of Cu resistance in induced and uninduced cell changes with the growth phase of the culture. Induced resistant cells accumulate less Cu than uninduced cells, so that reduced accumulation may be the mechanism of resistance. It is proposed that the inducible plasmid-coded Cu resistance interacts with the normal metabolism of the cell to protect against toxic levels of Cu while allowing continued operation of Cu-dependent functions.