Increase in silicon charge coupled devices speed with focused ion beam implanted channels
- 1 September 1991
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 9 (5) , 2714-2717
- https://doi.org/10.1116/1.585678
Abstract
No abstract availableThis publication has 0 references indexed in Scilit: