MOCVD of Zirconia Thin Films by Direct Liquid Injection Using a New Class of Zirconium Precursor

• 1 March 1998
• journal article
• research article
• Published by Wiley in Chemical Vapor Deposition
• Vol. 04  (02) , 46-49
• https://doi.org/10.1002/(sici)1521-3862(199803)04:02<46::aid-cvde46>3.0.co;2-1

Abstract

Keywords

• ZIRCONIA
• THD
• ZRO2
• ZIRCONIUM
• IPR
• LIQUID INJECTION
• TBU
• ZIRCONATES