Metal Diffraction Gratings - Preparation By Holographic Illumination

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Abstract
A system comprising a glass substrate, chromium layer and evaporated inorganic photoresist As2S3, onto which the diffraction image is registered was used. The recording of the gratings was made with Fresnel mirror. Ar laser with wave length 488 nm was used. To improve the sensitivity of the system and thus the accuracy of image registration the evaporated photoresist was preliminary subjected to predefined white light illumination. The processing method used (wet development and etching of the photoresist and the chromium layer) garanties the high quality of the image obtained and its transfer and multiplication. The parameters of the gratings obtained were measured and the diffraction efficiency was studied with He-Ne laser. The gratings thus prepared are used in a refractometric detector for total internal reflection.

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