Segment-based etch algorithm and modeling
- 1 January 1991
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
- Vol. 10 (9) , 1101-1109
- https://doi.org/10.1109/43.85756
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- A general simulator for VLSI lithography and etching processes: Part II—Application to deposition and etchingIEEE Transactions on Electron Devices, 1980
- Modeling ion millingJournal of Vacuum Science and Technology, 1979
- Considerations on high resolution patterns engraved by ion etchingIEEE Transactions on Electron Devices, 1975
- Evolution of well-defined surface contour submitted to ion bombardment: computer simulation and experimental investigationJournal of Materials Science, 1975