Two-Dimensional Simulation of Photolithography on Reflective Stepped Substrate
- 1 May 1987
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
- Vol. 6 (3) , 446-451
- https://doi.org/10.1109/tcad.1987.1270291
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- A general simulator for VLSI lithography and etching processes: Part I—Application to projection lithographyIEEE Transactions on Electron Devices, 1979
- Modeling projection printing of positive photoresistsIEEE Transactions on Electron Devices, 1975
- Characterization of positive photoresistIEEE Transactions on Electron Devices, 1975