An improved procedure to calculate the refractive index profile from the measured near-field intensity
- 1 March 1996
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in Journal of Lightwave Technology
- Vol. 14 (3) , 423-428
- https://doi.org/10.1109/50.485603
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
- Secondary-ion-mass spectrometry and near-field studies of Ti:LiNbO3 optical waveguidesJournal of Applied Physics, 1995
- A secondary-ion-mass spectrometry study of magnesium diffusion in lithium niobateJournal of Applied Physics, 1994
- Calculation of the field distribution of a Ti:LilNbO3 optical waveguide and its applicationsOptical and Quantum Electronics, 1992
- Determination of two-dimensional optical waveguide index distribution function parameters from effective indexesJournal of Lightwave Technology, 1990
- Index profiling of three-dimensional optical waveguides by the propagation-mode near-field methodJournal of Lightwave Technology, 1986
- Lithium niobate: Summary of physical properties and crystal structureApplied Physics A, 1985
- Construction of refractive-index profiles of planar dielectric waveguides from the distribution of effective indexesJournal of Lightwave Technology, 1985
- Index distribution of optical waveguides from their mode profileJournal of Lightwave Technology, 1983