Very-Low-Current Operation of Mesa-Stripe-Geometry Double-Heterostructure Injection Lasers

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Abstract
Mesa‐stripe‐geometry double‐heterostructure lasers which operate at low‐current level have been fabricated. Lasers of this geometry are made by etching the heterostructure layers, leaving a stripe region with a width ranging from 10 to 40 μm. The current‐spreading effect inherent in stripe‐geometry lasers is eliminated in this structure. As a result of the small active region and the low‐threshold current density, a significant reduction of total threshold current has been realized. The lowest‐threshold current is 50 mA in pulsed operation, and 75 mA in dc. The thermal resistance of the diode of this structure is nearly as low as that of the stripe‐geometry laser.