Annealing and substrate bias effects on perpendicular magnetic anisotropy in GdFe and TbFe sputtered films.
Open Access
- 1 January 1985
- journal article
- Published by The Magnetics Society of Japan in Journal of the Magnetics Society of Japan
- Vol. 9 (2) , 117-120
- https://doi.org/10.3379/jmsjmag.9.117
Abstract
GdFe and TbFe films sputtered with substrate bias voltage (VB) have been annealed both in air and in vacuum at temperatures up to 300°C In the case of annealing in air the oxidation occurs at the film surface and forms an oxidized layer that has in-plane magnetization,and therefore, the perpendicular anisotropy (Ku) decreases. Crystallographic structure of the films changes from the amorphous state into crystal-like one with increasing VB. The amorphous films sputtered with low VB oxidize more readily than the crystal-like films. Consequently the films sputtered with low VB show a larger decrease in Ku than those with high VB. Annealing in vacuum does not seem to change the film properties.Keywords
This publication has 2 references indexed in Scilit:
- Crystallographic Structures and Perpendicular Magnetization of GdFe Films Sputtered with Substrate Bias VoltageJapanese Journal of Applied Physics, 1983
- Amorphous metallic films for magneto-optic applicationsApplied Physics Letters, 1973