Plasma etching of organic materials. I. Polyimide in O2–CF4

• 1 May 1985
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B
• Vol. 3  (3) , 893-904
• https://doi.org/10.1116/1.583078

Abstract

Keywords

• ORGANIC MATERIAL
• PLASMA ETCHING