Surface patterning by pulsed-laser-induced transfer of metals and compounds

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Abstract
Besults of a systematic study on Q-switched nthy laser induced rrrn2 area transfer of supported titanium and chranium thin films and Ge/Se multilayer structures are reported. The appearance of the prints is governed by film-support adhesion and source-target spacing. Best quality prints are produced by ablating well adhering ntal films in close proximity ( spacing < 15 pm) to the target to be patterned. Transfer fran stacked elenntaxy layers as a source offers a unique possibility of depositing acinpound films by mixing the constituents and transferring the material onto the target substrate in a single step.

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