Ground-state energy of aion in two-dimensional semiconductors
- 15 April 1983
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 27 (8) , 4883-4886
- https://doi.org/10.1103/physrevb.27.4883
Abstract
The ground-state energy of a ion (a donor impurity ion with two attached electrons) in a two-dimensional semiconductor is calculated using a variational approach and is found to be about -4.48 Ry. The ground-state energy of a hydrogenic system in two dimensions is known to be -4 Ry. Thus the binding energy of a ion, defined as the energy required to remove one of the two electrons from the ion to infinity, is about 0.48 Ry. This is about 12% of the ground-state energy of a hydrogenic system in two dimensions. This is to be compared with the binding energy of a ion in three dimensions which is 5.55% of the hydrogenic ground-state energy. The relevance of our results to the problem of a ion in thin-quantum-well structures is discussed.
Keywords
This publication has 13 references indexed in Scilit:
- Screening effects on thesystem in semiconductorsPhysical Review B, 1982
- Stress dependence of the binding energy ofcenters in SiPhysical Review B, 1981
- ions in the high-magnetic-field limitPhysical Review B, 1981
- Giant binding ofcenters in polar crystalsPhysical Review B, 1981
- Variational studies of bound states of theion in a magnetic fieldPhysical Review B, 1979
- Proof that theIon Has Only One Bound StatePhysical Review Letters, 1977
- ,, andStates ofand of HePhysical Review B, 1962
- Mobile and Immobile Effective-Mass-Particle Complexes in Nonmetallic SolidsPhysical Review Letters, 1958
- Ground State of Two-Electron AtomsPhysical Review B, 1958
- Quantum Mechanics of One- and Two-Electron AtomsPublished by Springer Nature ,1957