Transport of evaporated material through support gas in conjunction with ion plating: I
- 1 May 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 149 (2) , 225-235
- https://doi.org/10.1016/0040-6090(87)90299-9
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Plasma assisted physical vapor deposition processes: A reviewJournal of Vacuum Science & Technology A, 1985
- Slowing down and thermalization of sputtered particle fluxes: Energy distributionsJournal of Applied Physics, 1983
- The interaction of low energy ion beams with surfacesThin Solid Films, 1981
- Importance of argon pressure in the preparation of rf-sputtered amorphous silicon–hydrogen alloysJournal of Vacuum Science and Technology, 1979
- Low-voltage triode sputtering with a confined plasma: Part I—geometric aspects of depositionJournal of Vacuum Science and Technology, 1974
- Thickness Distribution and Step Coverage in a New Planetary Substrate Holder GeometryJournal of Vacuum Science and Technology, 1972