Repetitive plasma focus as radiation source for x-ray lithography

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Abstract
Plasma focus devices employing gases Z≳2 are capable to produce a small volume of plasma, less than 1 mm in diameter, with electron density n e ∼ 1020 cm−3 and mean particle energy of about 1 keV. The dominant radiation of neon plasma is in the wavelength region between 0.7 nm and 1.2 nm, which is appropriate for x‐ray lithography. A 4 kJ plasma focus has been developed and investigated as a source for x‐ray lithography for industrial applications. Using proximity printing with a proximity distance of 40 μm and a source‐mask distance of 400 mm, a resolution to less than 0.3 μm has been achieved. Working with a repetition rate of several pulses per second a 30 mJ/cm2 sensitivity resist requires exposure time of 5 minutes.

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