Thermal Decomposition of Gallium Arsenide
- 1 January 1965
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 36 (1) , 308-313
- https://doi.org/10.1063/1.1713896
Abstract
Single crystals of GaAs containing Ga{111}, As{111}, and {110} faces decomposed at rates between 4×10−2 and 1×10−3 times the free evaporation rates were examined microscopically. At these high values, the decomposition rate is observed to be orientation dependent in the order As{111}>Ga{111}, as previously reported. The {110} face decomposes at a rate intermediate between the As{111} and the Ga{111} faces. At our high decomposition rates, the As{111} faces are completely corroded in a noncrystallographic manner, while crystallographic decomposition pits are produced on the Ga{111} face. At low decomposition rates, the degree of decomposition on all three faces appears equal and decomposition pits made up of {111} faces are formed. Surface kinks produced by mechanical damage and chemical etch pitting act as nucleation sites for decomposition pits. Dislocations do not serve as nucleation sites for decomposition pits. A model that accounts for the experimental observation is presented.This publication has 4 references indexed in Scilit:
- High-Temperature Oxidation and Vacuum Dissociation Studies on the A{111}and B{111}Surfaces of Gallium ArsenideJournal of the Electrochemical Society, 1961
- Characteristics of the {111} Surfaces of the III–V Intermetallic CompoundsJournal of the Electrochemical Society, 1960
- Surface melt patterns on siliconActa Crystallographica, 1958
- Melting Patterns Appearing on Single Crystals of InSbJournal of Applied Physics, 1956