Optimization of an electron cyclotron resonance plasma etch process for n+ polysilicon: HBr process chemistry
- 1 January 1994
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 12 (1) , 416-421
- https://doi.org/10.1116/1.587137
Abstract
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