Plasma Impulse CVD Deposited TiO2 Waveguiding Films: Properties and Potential Applications in Integrated Optical Sensor Systems
- 1 January 1992
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
Plasma impulse CVD deposited titania thin films, deposited at low substrate temperatures, exhibit low volume losses of < 0.2 dB/cm and high environmental stability. Their use in novel concepts for integrated optical immunosensors is discussed.Keywords
This publication has 13 references indexed in Scilit:
- Direct optical immunosensing (sensitivity and selectivity)Sensors and Actuators B: Chemical, 1992
- Plasma impulse chemical vapour deposition—a novel technique for the production of high power laser mirrorsMaterials Science and Engineering: A, 1991
- Investigations of TiO2 films deposited by different techniquesThin Solid Films, 1991
- Measurements of absorption losses in TiO_2 films by a collinear photothermal deflection techniqueApplied Optics, 1990
- Integrated optical input grating couplers as chemo- and immunosensorsSensors and Actuators B: Chemical, 1990
- Microstructure analysis of thin films deposited by reactive evaporation and by reactive ion platingJournal of Vacuum Science & Technology A, 1989
- Ion-Beam Processing of Optical Thin FilmsPublished by Elsevier ,1987
- Integrated optical switches and gas sensorsOptics Letters, 1984
- Measurement of Thin Film Parameters with a Prism CouplerApplied Optics, 1973
- Light Waves in Thin Films and Integrated OpticsApplied Optics, 1971