Laser enhanced and high speed jet selective electrodeposition
- 1 January 1988
- journal article
- research article
- Published by Taylor & Francis in Transactions of the IMF
- Vol. 66 (1) , 50-54
- https://doi.org/10.1080/00202967.1988.11870804
Abstract
Current techniques for selective electrodeposition are briefly mentioned, showing their advantages and disadvantages. The technique and principles of laser enhanced selective electrodeposition are explained and the results of experiments carried out to measure enhancements are given. An experimental plating unit is described which combines laser enhancement with electrolyte jetting. Plating rates achieved using this system have been found to be as high as 16μm/s on metallised ceramic substrates. Also described is a system for selectively depositing pure gold at high speed onto both metallic and metallised ceramic substrates using electrolyte jetting without the need for any masking thus giving the ability to “directly write” conducting tracks, contact pads, etc.Keywords
This publication has 3 references indexed in Scilit:
- Laser-enhanced jet plating: A method of high-speed maskless patterningApplied Physics Letters, 1983
- Investigation of Laser‐Enhanced Electroplating MechanismsJournal of the Electrochemical Society, 1981
- Laser enhanced electroplating and maskless pattern generationApplied Physics Letters, 1979